Nanoimprinted light trapping structures for thin-film solar cells

Eric Wang (Research School of Engineering)

SOLAR SEMINAR SERIES

DATE: 2012-03-15
TIME: 16:00:00 - 16:30:00
LOCATION: Ian Ross Seminar Room
CONTACT: JavaScript must be enabled to display this email address.

ABSTRACT:
Nanoimprint lithography (NIL) process promises high resolution, throughput and reliability for fabricating sub-micron features over a large area. However, some proposed NIL processes involve high temperature embossing step or intense light curing step, which are not ideal for solar cell applications. By combining sol-gel ink with NIL, we can fabricate sub-micron light trapping structures onto a planar solar cell surface or even as the last step of solar cell fabrication procedures. With some careful manipulation, it is possible to create periodic or semi-periodic plasmonic arrays and three-dimensional diffraction gratings. It is also possible to fabricate multi-layer structures where the enhancement performance can be predetermined by FDTD simulations.

BIO: